Research & Development World

  • R&D World Home
  • Topics
    • Aerospace
    • Automotive
    • Biotech
    • Careers
    • Chemistry
    • Environment
    • Energy
    • Life Science
    • Material Science
    • R&D Management
    • Physics
  • Technology
    • 3D Printing
    • A.I./Robotics
    • Software
    • Battery Technology
    • Controlled Environments
      • Cleanrooms
      • Graphene
      • Lasers
      • Regulations/Standards
      • Sensors
    • Imaging
    • Nanotechnology
    • Scientific Computing
      • Big Data
      • HPC/Supercomputing
      • Informatics
      • Security
    • Semiconductors
  • R&D Market Pulse
  • R&D 100
    • Call for Nominations: The 2025 R&D 100 Awards
    • R&D 100 Awards Event
    • R&D 100 Submissions
    • Winner Archive
    • Explore the 2024 R&D 100 award winners and finalists
  • Resources
    • Research Reports
    • Digital Issues
    • R&D Index
    • Subscribe
    • Video
    • Webinars
  • Global Funding Forecast
  • Top Labs
  • Advertise
  • SUBSCRIBE

A Direct Writing Method of Graphene Modification

By AIMEN | August 1, 2018

Graphene is one of the most promising materials for advanced electronics due to its extraordinary chemical and physical properties. The interaction between the graphene lattice and light opens the way for the development of novel devices with superior functionality. Nevertheless, technology used for traditional silicon electronics is unlikely suitable for graphene. Photolithography is the main process in semiconductor production, using polymers and liquids that can drastically alter the initial properties of graphene. The novel maskless methods are in active development in graphene technology.

An international team of researchers from National Research University of Electronic Technology (Russia), Forschungszentrum Jülich (Germany) and AIMEN Technological center (Spain) has developed a direct writing method of graphene modification. The authors utilize the ultrafast laser functionalization of single-layer CVD graphene for maskless fabrication of micro- and nanoscale devices. The authors suggest that the femtosecond laser provide photo-chemical reaction (reaction initiated under light exposure only) in the area of laser sport on graphene leading to its modification by oxidative groups. These groups drastically modify the electrical and optical properties of graphene providing functional in-plane device development without using any complicated mask-based technology.

Both electrical and optical properties of graphene is drastically changing under femtosecond pulsed laser processing. Image: MIET

The authors produced p-p+ junctions in graphene field effect transistors via fs-laser pulses. The fabricated photodetectors work at room temperature and do not need the external cooling. The highest photoresponsivity of 100 mA/W was observed in modified structures.

This study provides a first step in progress of fully maskless methods for processing of novel nanomaterials. Changing the environment during fs-laser treatment may lead to a different functionalization of graphene surface. Additionally, other 2-D materials like phosphorene provide very good photochemical activity and can be processed the same way. The study shows that the fully integrated photodetector with high responsibility, low noise, and high linear dynamic range is feasible by maskless patterning on graphene surfaces through ultrafast laser processing.

The researchers discuss their technology further in ACS Photonics, an American Chemical Society publication.

Source: AIMEN

Warning: Cannot modify header information – headers already sent by (output started at /app/docroot/includes/common.inc:2777) in /app/docroot/includes/bootstrap.inc on line 1486

Related Articles Read More >

The emerging materials shaping next-generation semiconductor electronics
24 R&D trends that redefined 2024
Graphene-based flowmeter sensor measures nano-rate fluid flows, Part 3: The sensor
Graphene-based flowmeter sensor measures nano-rate fluid flows, Part 2: The graphene context
rd newsletter
EXPAND YOUR KNOWLEDGE AND STAY CONNECTED
Get the latest info on technologies, trends, and strategies in Research & Development.
RD 25 Power Index

R&D World Digital Issues

Fall 2024 issue

Browse the most current issue of R&D World and back issues in an easy to use high quality format. Clip, share and download with the leading R&D magazine today.

Research & Development World
  • Subscribe to R&D World Magazine
  • Enews Sign Up
  • Contact Us
  • About Us
  • Drug Discovery & Development
  • Pharmaceutical Processing
  • Global Funding Forecast

Copyright © 2025 WTWH Media LLC. All Rights Reserved. The material on this site may not be reproduced, distributed, transmitted, cached or otherwise used, except with the prior written permission of WTWH Media
Privacy Policy | Advertising | About Us

Search R&D World

  • R&D World Home
  • Topics
    • Aerospace
    • Automotive
    • Biotech
    • Careers
    • Chemistry
    • Environment
    • Energy
    • Life Science
    • Material Science
    • R&D Management
    • Physics
  • Technology
    • 3D Printing
    • A.I./Robotics
    • Software
    • Battery Technology
    • Controlled Environments
      • Cleanrooms
      • Graphene
      • Lasers
      • Regulations/Standards
      • Sensors
    • Imaging
    • Nanotechnology
    • Scientific Computing
      • Big Data
      • HPC/Supercomputing
      • Informatics
      • Security
    • Semiconductors
  • R&D Market Pulse
  • R&D 100
    • Call for Nominations: The 2025 R&D 100 Awards
    • R&D 100 Awards Event
    • R&D 100 Submissions
    • Winner Archive
    • Explore the 2024 R&D 100 award winners and finalists
  • Resources
    • Research Reports
    • Digital Issues
    • R&D Index
    • Subscribe
    • Video
    • Webinars
  • Global Funding Forecast
  • Top Labs
  • Advertise
  • SUBSCRIBE