Entegris Inc. offers the VaporSorb filter for cleanroom environments and for process tools during key steps in semiconductor manufacturing. VaporSorb filters have been engineered to capture airborne organics, bases, and strong acids, all in one filter.
 
Suitable for photolithography coater/developer tracks, the filter was created as a “four-in-one” filter solution to avoid the complexities of multi-filter handling and to build on the previous “three-in-one” technology.
 
Examples of weak acids include acetic and formic acids (acetate; CH3COO- and formate; HCOO-) and nitrous acid (nitrite; NO2-). These contaminants are causing concerns regarding defects and yield in photolithography processing, since they are not removed by traditional AMC filters and, furthermore, may be formed from organic contamination when using traditional filter designs.
 
Entegris Inc.