This 200x photo of cracked and wrinkled photoresist — a light-sensitive material used in industrial processes, such as photoengraving and photolithography, to form a patterned coating on a surface — received an Image of Distinction designation in the 2013 Nikon Small World Photomicrophotography Competition, which recognizes excellence in photography with the optical microscope. It was taken by Dr. Pedro Barrios-Perez of the National Research Council of Canada Information and Communication Technologies, CPFC (nanofabrication) in Ottawa, Ontario, Canada, using a brightfield technique.
www.nikonsmallworld.com
