Carl Zeiss Microscopy offers the Orion NanoFab, a multi-ion-beam tool based on Gas Field Ion Source technology. As an enhancement to the existing helium ion microscope, Orion NanoFab also utilizes neon ions, making the system capable of providing a sub-10 nanometer nanofabrication and sub-nanometer imaging solution for industry, government, and academic research laboratories. An optional gallium focused ion beam column can also be integrated.
The neon ion beam offers precise machining and nanofabrication capabilities due to higher sputter yields in ion beam milling and faster resist exposure in ion beam lithography. The helium ion beam allows sub-10 nm nanofabrication as well as high resolution imaging capability in the same instrument. The optional gallium FIB column allows massive material removal.
