The EVG 720 is an automated UV nanoimprint lithography system that is capable of printing nanostructures down to 40nm over a large area. The system is suitable for large-scale production of bioMEMS devices, such as optics, photonics, microfluidics, and light emitting diodes, as well as sophisticated data storage devices.
The device leverages an advanced UV-NIL technology to facilitate volume manufacturing of micro- and nanometer-scale structures. The system allows integrated stamp manufacturing, which prevents the necessity for stand-alone stamp replication systems, and also allows inert gas printing. Particle contamination is reduced by means of integrated electrostatic discharge, and optical clearance removes any visible vacuum lines in the active imprint area.
Other features include integrated separation of stamp and substrate, top and/or bottom side alignment, open material platform for commercially available imprint materials, and a large area imprint.
