The 34th Annual SPIE Photomask Symposium, organized by SPIE and BACUS, the International Technical Group of SPIE, provides the world’s largest forum to discuss the latest mask technologies and how they can meet the needs of the rapidly moving semiconductor industry.
Topics included will be Mask Making; Larger Glass, Smaller Fields, and Materials for 450mm; Emerging Mask Technologies; Mask Application; and Mask Business.
It will be held from September 16-18, 2014.
Monterey, Calif.
http://spie.org/photomask.xml?WT.mc_id=RCal-PMW