A high-performance chromium-antimony absorber material for next-generation lithography photomasks
Established in 1963, the R&D 100 Awards is the only S&T (science and technology) awards competition that recognizes new commercial products, technologies and materials for their technological significance that are available for sale or license. The R&D 100 Awards have long been a benchmark of excellence for industry sectors as diverse as telecommunications, high-energy physics, software, manufacturing, and biotechnology. This 2021 R&D 100 winner is listed below, along with its respective category.
Category: Mechanical/Materials
Developers: Lawrence Berkeley National Laboratory
United States
Product Description:An innovative photomask absorber material with tunable optical properties that enables high resolution, single-exposure patterning using Extreme Ultraviolet Lithography for fabricating tomorrow’s computer chips today.
Developers: Lawrence Berkeley National Laboratory
United States
Product Description:An innovative photomask absorber material with tunable optical properties that enables high resolution, single-exposure patterning using Extreme Ultraviolet Lithography for fabricating tomorrow’s computer chips today.
EUV mask absorber cross section