A high-performance chromium-antimony absorber material for next-generation lithography photomasks
Category: Mechanical/Materials
Developers: Lawrence Berkeley National Laboratory
United States
Product Description:An innovative photomask absorber material with tunable optical properties that enables high resolution, single-exposure patterning using Extreme Ultraviolet Lithography for fabricating tomorrow’s computer chips today.
Developers: Lawrence Berkeley National Laboratory
United States
Product Description:An innovative photomask absorber material with tunable optical properties that enables high resolution, single-exposure patterning using Extreme Ultraviolet Lithography for fabricating tomorrow’s computer chips today.
EUV mask absorber cross section