UV 26GNF
Category: Mechanical/Materials
Developers: DuPont
Product Description:For decades, scientists have sought a feasible pathway to develop non-PFAS photoacid generators, aiming to create sustainable deep ultraviolet (DUV) photoresists but largely failed in their efforts. UV26GNF is described as the first positive tone photoresist used for 248‑nanometre lithography that does not contain any fluorine. In short, UV26GNF is a positive tone photoresist that operates like any other 248nm lithography photoresist. The formulation of UV26GNF photoresist is the result of careful selection, with each component playing a vital role in enhancing its overall performance. Central to this effectiveness are the chemical reactions involving a light-sensitive, non-fluorinated PAG. This innovative photoresist is not only scalable and robust but also offers advantages over existing alternatives in various lithographic metrics. Moreover, the implications of the inventions and innovations backing UV26GNF have opened doors for additional non-fluorine technologies that impact 193nm dry and immersion lithography, as well as various anti-reflective coatings and Extreme Ultraviolet Lithography (EUV). UV26GNF represents a solution for photolithography utilizing a Krypton Fluoride (KrF) laser (248nm).
Developers: DuPont
Product Description:For decades, scientists have sought a feasible pathway to develop non-PFAS photoacid generators, aiming to create sustainable deep ultraviolet (DUV) photoresists but largely failed in their efforts. UV26GNF is described as the first positive tone photoresist used for 248‑nanometre lithography that does not contain any fluorine. In short, UV26GNF is a positive tone photoresist that operates like any other 248nm lithography photoresist. The formulation of UV26GNF photoresist is the result of careful selection, with each component playing a vital role in enhancing its overall performance. Central to this effectiveness are the chemical reactions involving a light-sensitive, non-fluorinated PAG. This innovative photoresist is not only scalable and robust but also offers advantages over existing alternatives in various lithographic metrics. Moreover, the implications of the inventions and innovations backing UV26GNF have opened doors for additional non-fluorine technologies that impact 193nm dry and immersion lithography, as well as various anti-reflective coatings and Extreme Ultraviolet Lithography (EUV). UV26GNF represents a solution for photolithography utilizing a Krypton Fluoride (KrF) laser (248nm).
