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High Purity CVD Silicon Carbide

By R&D Editors | May 8, 2015

Morgan Advanced Materials announces the availability of high purity chemical vapor deposition (CVD) silicon carbide (SiC), a material ideal for semiconductor equipment components. Morgan offers precision-machined RTP edge rings along with gas distribution plates and focus rings for plasma etch. Also available are metal organic chemical vapor deposition (MOCVD) components used to manufacture light-emitting diode (LED) lights.

The freestanding monolithic CVD SiC material is available in two grades. HR SiC (High Resistivity), a black material optically translucent in thin sections, has an electrical resistivity greater than 1 ohm-cm (ohms centimeter) and is 99.9995 percent pure. ELR SiC (Engineered Low Resistivity) is 99.9999 percent pure.

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