The Tractrix tool from Spintrac can process substrates from 2-in. to 450mm, provide PC control and programmability, and produce products with uniformity on a par with tier-1 systems.
The unit can be utilized for R&D applications such as process chemical development and advanced lithography development. It can also be used for g-line, i-line, and DUV applications. It can handle substrates such as silicon, compound semi (GaAs, others), and glass, and round, square, and rectangle substrate shapes.